PECVD Components
PLASMA SOURCES
For the generation of plasmas different types of plasma sources are used. Starting with the simple DC discharge, over RF-ECR or microwave sources there are many possibilities to generate a plasma. robeko – offers a wide range of different types for different applications.
PLASMA
SOURCES
SOURCES
For the generation of plasmas different types of plasma sources are used. Starting with the simple DC discharge, over RF-ECR or microwave sources there are many possibilities to generate a plasma. robeko – offers a wide range of different types for different applications.
PLASMA MONITORING &
PROCESS CONTROL
PROCESS CONTROL
Process control is essential in industrial plasma applications to ensure reliability and high quality. The EMICON system is a plasma monitoring system based on optical emission spectroscopy that allows real-time analysis, optimization and control of the processes in your plasma application.
PLASMA MONITORING &
PROCESS CONTROL
PROCESS CONTROL
Die Prozesssteuerung ist bei industriellen Plasmaanwendungen unerlässlich, um Zuverlässigkeit und hohe Qualität zu
Process control is essential in industrial plasma applications to ensure reliability and high quality. The EMICON system is a plasma monitoring system based on optical emission spectroscopy that allows real-time analysis, optimization and control of the processes in your plasma application.
PLASMA MONITORING &
PROCESS CONTROL
PROCESS CONTROL
Process control is essential in industrial plasma applications to ensure reliability and high quality. The EMICON system is a plasma monitoring system based on optical emission spectroscopy that allows real-time analysis, optimization and control of the processes in your plasma application.
