Composants PECVD

SOURCES DE PLASMA

Une grande variété de sources de plasma est utilisée pour générer des plasmas. De la simple décharge en courant continu aux sources HF-ECR ou micro-ondes, il existe de nombreuses possibilités de générer un plasma.
robeko – offre un large éventail de types différents pour diverses applications.

PECVD KOMPONENTEN | Microwave Plasma Source
robeko MIRO 200 CI | Microwave Plasma Source

MIRO 200 CI | Microwave Plasma Source

MIRO 200 CI | Microwave Plasma Source

The MIRO 200 CI.

Datasheet

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sairem AuraWave | ECR Coaxial Plasma Source

sairem AuraWave | ECR Coaxial Plasma Source

sairem AuraWave | ECR Coaxial Plasma Source

Aura-Wave has been designed to be self-adapted once the plasma ignited. A magnetic field combined to the electromagnetic wave allows the creation of plasma at low pressure – range of 10-3 mbar.

Datasheet

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SOURCES DE PLASMA

Une grande variété de sources de plasma est utilisée pour générer des plasmas. De la simple décharge en courant continu aux sources HF-ECR ou micro-ondes, il existe de nombreuses possibilités de générer un plasma.
robeko – offre un large éventail de types différents pour diverses applications.

robeko MIRO 200 CI | Microwave Plasma Source

MIRO 200 CI | Microwave Plasma Source

MIRO 200 CI | Microwave Plasma Source

The MIRO 200 CI.

Datasheet

BUY online

sairem AuraWave | ECR Coaxial Plasma Source

sairem AuraWave | ECR Coaxial Plasma Source

sairem AuraWave | ECR Coaxial Plasma Source

Aura-Wave has been designed to be self-adapted once the plasma ignited. A magnetic field combined to the electromagnetic wave allows the creation of plasma at low pressure – range of 10-3 mbar.

Datasheet

BUY online

PECVD KOMPONENTEN | Microwave Plasma Source

SOURCES DE PLASMA

Une grande variété de sources de plasma est utilisée pour générer des plasmas. De la simple décharge en courant continu aux sources HF-ECR ou micro-ondes, il existe de nombreuses possibilités de générer un plasma.
robeko – offre un large éventail de types différents pour diverses applications.

robeko MIRO 200 CI | Microwave Plasma Source

MIRO 200 CI | Microwave Plasma Source

MIRO 200 CI | Microwave Plasma Source

The MIRO 200 CI.

Datasheet

BUY online

sairem AuraWave | ECR Coaxial Plasma Source

sairem AuraWave | ECR Coaxial Plasma Source

sairem AuraWave | ECR Coaxial Plasma Source

Aura-Wave has been designed to be self-adapted once the plasma ignited. A magnetic field combined to the electromagnetic wave allows the creation of plasma at low pressure – range of 10-3 mbar.

Datasheet

BUY online

PECVD KOMPONENTEN | Microwave Plasma Source

SURVEILLANCE DU PLASMA
CONTRÔLE DES PROCESSUS

Le contrôle du processus est essentiel dans les applications industrielles du plasma pour garantir la fiabilité et la haute qualité. Le système EMICON est un système de surveillance du plasma basé sur la spectroscopie d’émission optique qui permet d’analyser, d’optimiser et de contrôler en temps réel les processus de votre application plasma.

PLASUS | Plasma Monitoring & Process Control
PLASUS | EMICON MC

EMICON MC | Plasma Monitor and Process Control System

EMICON MC | Plasma Monitor and Process Control System

The EMICON MC systems are qualified for most applications in plasma technology for analyzing the plasma, for optimizing the process, for plasma monitoring, for quality control and for process controlling. The turn-key EMICON MC systems come with all features necessary for monitoring common plasma processes and for communicating via analog and digital outputs with the application control.

Datasheet

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PLASUS | EMICON SA

EMICON SA | Plasma Monitor and Process Control System

EMICON SA | Plasma Monitor and Process Control System

The EMICON SA systems are especially designed for process control and quality assurance in industrial plants and production lines. The integrated processor unit ensures stand-alone operation in 24/7 mode and easy integration of the EMICON SA system into the system conrol by e.g. LAN or Profibus.

Datasheet

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PLASUS | EMICON HR

EMICON HR | Plasma Monitor and Process Control System

EMICON HR | Plasma Monitor and Process Control System

The EMICON HR system is a high-resolution spectrometer system and it is especially qualified for detailed spectral plasma analysis and plasma monitoring but also for quality control and process controlling. The single channel EMICON HR system comes with all features necessary for monitoring and anaylzing process plasmas in detail.

Datasheet

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PLASUS | VACUUMOPTICS

VACUUMOPTICS | Optical Components

VACUUMOPTICS | Optical Components

Optical components are the interface between the application process and the detection system: The optics should transfer as much light intensity as possible and it should be flexible and resistant to industrial environments.

Datasheet

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PLASUS | SPECLINE

SPECLINE | Spectral Line Identification

SPECLINE | Spectral Line Identification

PLASUS SpecLine is the most powerful software tool for evaluating your spectral data. The worldwide unique database for atoms and molecules makes line identification fast and easy.

Datasheet

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SURVEILLANCE DU PLASMA
& CONTRÔLE DE PROCESSUS

Le contrôle du processus est essentiel dans les applications industrielles du plasma pour garantir la fiabilité et la haute qualité. Le système EMICON est un système de surveillance du plasma basé sur la spectroscopie d’émission optique qui permet d’analyser, d’optimiser et de contrôler en temps réel les processus de votre application plasma.

PLASUS | EMICON MC

EMICON MC | Plasma Monitor and Process Control System

EMICON MC | Plasma Monitor and Process Control System

The EMICON MC systems are qualified for most applications in plasma technology for analyzing the plasma, for optimizing the process, for plasma monitoring, for quality control and for process controlling. The turn-key EMICON MC systems come with all features necessary for monitoring common plasma processes and for communicating via analog and digital outputs with the application control.

Datasheet

BUY online

PLASUS | EMICON SA

EMICON SA | Plasma Monitor and Process Control System

EMICON SA | Plasma Monitor and Process Control System

The EMICON SA systems are especially designed for process control and quality assurance in industrial plants and production lines. The integrated processor unit ensures stand-alone operation in 24/7 mode and easy integration of the EMICON SA system into the system conrol by e.g. LAN or Profibus.

Datasheet

BUY online

PLASUS | EMICON HR

EMICON HR | Plasma Monitor and Process Control System

EMICON HR | Plasma Monitor and Process Control System

The EMICON HR system is a high-resolution spectrometer system and it is especially qualified for detailed spectral plasma analysis and plasma monitoring but also for quality control and process controlling. The single channel EMICON HR system comes with all features necessary for monitoring and anaylzing process plasmas in detail.

Datasheet

BUY online

PLASUS | VACUUMOPTICS

VACUUMOPTICS | Optical Components

VACUUMOPTICS | Optical Components

Optical components are the interface between the application process and the detection system: The optics should transfer as much light intensity as possible and it should be flexible and resistant to industrial environments.

Datasheet

BUY online

PLASUS | SPECLINE

SPECLINE | Spectral Line Identification

SPECLINE | Spectral Line Identification

PLASUS SpecLine is the most powerful software tool for evaluating your spectral data. The worldwide unique database for atoms and molecules makes line identification fast and easy.

Datasheet

BUY online

PLASUS | Plasma Monitoring & Process Control

SURVEILLANCE DU PLASMA &
CONTRÔLE DE PROCESSUS

Le contrôle du processus est essentiel dans les applications industrielles du plasma pour garantir la fiabilité et la haute qualité. Le système EMICON est un système de surveillance du plasma basé sur la spectroscopie d’émission optique qui permet d’analyser, d’optimiser et de contrôler en temps réel les processus de votre application plasma.

PLASUS | EMICON MC

EMICON MC | Plasma Monitor and Process Control System

EMICON MC | Plasma Monitor and Process Control System

The EMICON MC systems are qualified for most applications in plasma technology for analyzing the plasma, for optimizing the process, for plasma monitoring, for quality control and for process controlling. The turn-key EMICON MC systems come with all features necessary for monitoring common plasma processes and for communicating via analog and digital outputs with the application control.

Datasheet

BUY online

PLASUS | EMICON SA

EMICON SA | Plasma Monitor and Process Control System

EMICON SA | Plasma Monitor and Process Control System

The EMICON SA systems are especially designed for process control and quality assurance in industrial plants and production lines. The integrated processor unit ensures stand-alone operation in 24/7 mode and easy integration of the EMICON SA system into the system conrol by e.g. LAN or Profibus.

Datasheet

BUY online

PLASUS | EMICON HR

EMICON HR | Plasma Monitor and Process Control System

EMICON HR | Plasma Monitor and Process Control System

The EMICON HR system is a high-resolution spectrometer system and it is especially qualified for detailed spectral plasma analysis and plasma monitoring but also for quality control and process controlling. The single channel EMICON HR system comes with all features necessary for monitoring and anaylzing process plasmas in detail.

Datasheet

BUY online

PLASUS | VACUUMOPTICS

VACUUMOPTICS | Optical Components

VACUUMOPTICS | Optical Components

Optical components are the interface between the application process and the detection system: The optics should transfer as much light intensity as possible and it should be flexible and resistant to industrial environments.

Datasheet

BUY online

PLASUS | SPECLINE

SPECLINE | Spectral Line Identification

SPECLINE | Spectral Line Identification

PLASUS SpecLine is the most powerful software tool for evaluating your spectral data. The worldwide unique database for atoms and molecules makes line identification fast and easy.

Datasheet

BUY online

PLASUS | Plasma Monitoring & Process Control

PECVD Composants