PVD-Komponenten

ROHRKATHODEN

Sputtering Components, Inc. ist der weltweit führende Anbieter von zuverlässigen und preiswerten Endblöcken für Rohrkathoden, kompletten Kathodendeckeln und Magnetsystemen nach dem neuesten Stand der Technik. Alle SCI-Produkte ermöglichen dem Endbenutzer schnelle, kostengünstige, hausinterne Wartungsarbeiten. Dies ermöglicht die im Vergleich niedrigsten Gesamtinvestitionskosten.
robeko ist exklusiver Vertriebs- und Servicepartner von Sputtering Components für Mittel- und Osteuropa.

SCI | Rohrkathoden
Internal-Mount End Blocks

SC-SERIES Internal Mount End Block

SC-SERIES Internal Mount End Block

The industry-standard size SC-Series, internal mount end block is the lowest cost, highest power, and most reliable end block available.

Technical Data:

  • Power: max. 200 kW DC or MFAC
  • V/A: 1500 V/450 A
  • Target: max. 4000 mm
  • Average weight: 40 kg

Datasheet

B2B online


MC-SERIES Internal Mount End Block

MC-SERIES Internal Mount End Block

With a more compact design than the SC and a lower power rating, the MC is designed for smaller systems.

Technical Data:

  • Power: max. 100 kW DC or MFAC
  • V/A: 1500 V/225 A
  • Target: max. 2500 mm
  • Thickness: 154 mm
  • Average weight: 20 kg

Datasheet

B2B online


cMC-SERIES Internal Mount End Block

cMC-SERIES Internal Mount End Block

The cMC is designed to directly replace compact end blocks from other manufacturers as well as to use in new systems.

Technical Data:

  • Power: max. 80 kW DC or MFAC
  • V/A: 1500 V/180 A
  • Target: max. 2000 mm
  • Thickness: 125 mm

Datasheet

B2B online


CC-SERIES Internal Mount End Block

CC-SERIES Internal Mount End Block

With its extremely compact package, the CC is designed for 80 mm ID targets, making it an excellent choice for small systems or R&D systems.

Technical Data:

  • Power: max. 20 kW DC or MFAC
  • V/A: 1500 V/50 A
  • Target: max. 1000 mm
  • Thickness: 122 mm

Datasheet

B2B online


TC-SERIES Internal Mount End Block

TC-SERIES Internal Mount End Block

Designed to replace planar cathodes where space on the end is limited, the TC-Series internal-mount end block will increase the output and quality of your existing coater.
A two-ended design, it has the most compact end block available for standard 125 mm ID industrial targets.

Technical Data:

  • Power: max. 40 kW DC or MFAC
  • V/A: 1500 V/100 A
  • Target: max. 1500 mm
  • Thickness: 58 mm on each side
  • Average weight: 10 kg

Datasheet

B2B online

External-Mount End Blocks

SM-SERIES External Mount End Block

SM-SERIES External Mount End Block

Our largest external-mount end block, the SM can accommodate targets up to 4000 mm (supported) and has a power rating of up to 200 kW DC or 80 kHz MFAC.
It uses the same patented technology as our internal end blocks to deliver outstanding value, performance and reliability but has a wider substrate coverage and customizable drive shaft length.

Technical Data:

  • Power: max. 200 kW DC or MFAC
  • V/A: 1500 V/450 A
  • Target: max. 4000 mm
  • Average weight: 60 kg

Datasheet

B2B online


MM-SERIES External Mount End Block

MM-SERIES External Mount End Block

The MM is our mid-size external-mount end block.
It uses the same patented technology as our internal end blocks to deliver outstanding value, performance and reliability but has a wider substrate coverage and a customizable drive shaft length.

Technical Data:

  • Power: max. 100 kW DC or MFAC
  • V/A: 1500 V/225 A
  • Target: max. 2500 mm
  • Average weight: 30 kg

Datasheet

B2B online


CM-SERIES External Mount End Block

CM-SERIES External Mount End Block

For either 125 mm or 80 mm ID diameter targets, the CM is our most compact external-mount end block.
It uses the same patented technology as our internal end blocks to deliver outstanding value, performance and reliability but has a wider substrate coverage and a customizable drive shaft length.

Technical Data:

  • Power: max. 20 kW DC or MFAC
  • V/A: 1500 V/50 A
  • Target: max. 1000 mm
  • Average weight: 15 kg

Datasheet

B2B online

Swing Cathode™ SMS, MMS & CMS

Swing Cathode™ SMS, MMS & CMS

Swing Cathode™ SMS, MMS & CMS

With the Swing Cathode™ external-mount end block, the magnet pack swings in a programmable rotary axis that is independent of the rotating target tube, making it an ideal system for display or 3D part coating.
Other uses for Swing Cathodes™ are to pivot the magnet bar to a burn in location or to make magnet bar position adjustments via remote control.

Technical Data:

  • Power: max. 200 kW DC or MFAC
  • V/A: 1500 V/450 A
  • Target: max. 4000 mm
  • Average weight: 15 kg

Datasheet

B2B online


Swing-Duo™ Software

Swing-Duo™ Software

Swing-DUO™ (Dynamic Uniformity Optimization) software is designed to simulate the combined cathode array uniformity for individually optimized motion profiles used to control the motion of the SCI magnet bars when used with our exclusive Swing Cathode™.

Datasheet

B2B online

IM End Block

IM End Block™

IM End Block

While the typical end block rotates a target tube around a stationary magnet bar, the IM external-mount end block continuously rotates the magnet bar inside a stationary target tube.

  • For coating the insides of tubular-shaped objects
  • For decorative or tool coatings (where objects are placed around the cathode)

The IM can be configured for targets with inside diameters of either 80 mm or 125 mm.

Technical Data:

  • Power: max. 60 kW DC or MFAC
  • V/A: 1500 V/150 A
  • Target: max. 2000 mm
  • Maintenance: Do-it-yourself on your schedule and in your facility; Typical requirements: 1 hr./year to change seals

Datasheet

B2B online

Advanced Magnetics for 125 mm ID Targets

Advanced Magnetics

Advanced Magnetics

SCI Advanced Magnetics are available in three basic models: the three-row TRM-Bar™ and the four-row mQRM-Bar™ and QRM-Bar™, which have a patented turnaround to increase target utilization.

Datasheet

B2B online

Magnet Bars for 80 mm ID Targets

Magnet Bars for 80 mm ID Targets

Magnet Bars for 80 mm ID Targets

Available in two basic models, magnet bars for 80 mm inside diameter targets have the following advantages:

  • Designed using 3D finite element analysis software - for meeting your application requirements
  • Carefully matched, high-strength magnets that are factory calibrated using an automated magnet bar measurement tool - for uniform coatings
  • Fully encapsulated magnets and robust construction - for many years of trouble-free operation
  • Long-life, multi-roller system - for reliable sputter up, sputter down or off-angle sputtering
  • Magnetic positioning points that are easily set using simple tools - for easy uniformity adjustment
  • A simple installation procedure with solutions for vertical installation and connecting to end blocks from other manufacturers

Technical Data:

  • Target ID:
    TRM/SRM80-Bar™: 115 mm
  • Gauss (typical):
    TRM80-Bar™: To be determined
    SRM80-Bar™: 565
  • Sputter Angle:
    TRM80-Bar™: +/- 19°
    SRM80-Bar™: +/- 28°

Datasheet

B2B online

RAM-Bar™

RAM-Bar™

RAM-Bar™

With the Remotely Adjustable Magnet Bar, you can position and fine tune the distance between the magnetics and the target surface from outside the system and during operation to eliminate costly system shutdown.
Compatible with all SCI end blocks for 125 mm ID targets and available with any of the advanced magnetics, the RAM-Bar™ allows for up to 4 mm vertical difference between adjustment locations for very fine tuning. It can attain uniformity requirements of less than +/-1%.

Technical Data:

  • Target/Backing Tube Length: max. 550 - 4000 mm
  • Maximum Target Diameter: 180 mm
  • Adjuster Pitch: 305 mm (12 inches)
  • Maximum Film Uniformity: under +/-1%
  • Movement Precision: ± 250 µm of travel

Datasheet

B2B online

ARM-Bar™

ARM-Bar™

ARM-Bar™

We designed the Air Retractable Magnet Bar (ARM-Bar™) for sputtering ferromagnetic materials: alloys of iron, cobalt and a few “rare-earth" elements.
With the magnet bar raised and lowered using air bladders, the ARM-Bar™ provides the utilization and up-time benefits of a rotary cathode while allowing safe and easy insertion into the target, adjustment and removal.
In order to penetrate the magnetic material, the ARM-Bar™ has our strongest magnet bar, the QRM-Bar™.
Typical applications include EMI shielding, nickel sputtering as an adhesion layer for polyimide substrates, and magnetic storage.

Datasheet

B2B online

e-Cathode™

e-Cathode™

e-Cathode™

Sputtering Components e-Cathode™ process lids (compartments) and doors are a turnkey solution for new or existing coaters.

OEM lids for new coaters
Available in both digital and analog formats, vertical or horizontal orientation and customized to end user needs. OEM lids and doors can be purchased as a complete system or scaled-back according to your requirements.

Lid clones
For users needing to add cathodes to their existing coater, our process lid clones match all your current external mechanical and electrical interfaces but use SCI end blocks, magnet bars and control systems. We can also modify your existing lid designs to meet your changing needs.

Datasheet

B2B online

ROHRKATHODEN

Sputtering Components, Inc. ist der weltweit führende Anbieter von zuverlässigen und preiswerten Endblöcken für Rohrkathoden, kompletten Kathodendeckeln und Magnetsystemen nach dem neuesten Stand der Technik. Alle SCI-Produkte ermöglichen dem Endbenutzer schnelle, kostengünstige, hausinterne Wartungsarbeiten. Dies ermöglicht die im Vergleich niedrigsten Gesamtinvestitionskosten.
robeko ist exklusiver Vertriebs- und Servicepartner von Sputtering Components für Mittel- und Osteuropa.

Internal-Mount End Blocks

SC-SERIES Internal Mount End Block

SC-SERIES Internal Mount End Block

The industry-standard size SC-Series, internal mount end block is the lowest cost, highest power, and most reliable end block available.

Technical Data:

  • Power: max. 200 kW DC or MFAC
  • V/A: 1500 V/450 A
  • Target: max. 4000 mm
  • Average weight: 40 kg

Datasheet

B2B online


MC-SERIES Internal Mount End Block

MC-SERIES Internal Mount End Block

With a more compact design than the SC and a lower power rating, the MC is designed for smaller systems.

Technical Data:

  • Power: max. 100 kW DC or MFAC
  • V/A: 1500 V/225 A
  • Target: max. 2500 mm
  • Thickness: 154 mm
  • Average weight: 20 kg

Datasheet

B2B online


cMC-SERIES Internal Mount End Block

cMC-SERIES Internal Mount End Block

The cMC is designed to directly replace compact end blocks from other manufacturers as well as to use in new systems.

Technical Data:

  • Power: max. 80 kW DC or MFAC
  • V/A: 1500 V/180 A
  • Target: max. 2000 mm
  • Thickness: 125 mm

Datasheet

B2B online


CC-SERIES Internal Mount End Block

CC-SERIES Internal Mount End Block

With its extremely compact package, the CC is designed for 80 mm ID targets, making it an excellent choice for small systems or R&D systems.

Technical Data:

  • Power: max. 20 kW DC or MFAC
  • V/A: 1500 V/50 A
  • Target: max. 1000 mm
  • Thickness: 122 mm

Datasheet

B2B online


TC-SERIES Internal Mount End Block

TC-SERIES Internal Mount End Block

Designed to replace planar cathodes where space on the end is limited, the TC-Series internal-mount end block will increase the output and quality of your existing coater.
A two-ended design, it has the most compact end block available for standard 125 mm ID industrial targets.

Technical Data:

  • Power: max. 40 kW DC or MFAC
  • V/A: 1500 V/100 A
  • Target: max. 1500 mm
  • Thickness: 58 mm on each side
  • Average weight: 10 kg

Datasheet

B2B online

External-Mount End Blocks

SM-SERIES External Mount End Block

SM-SERIES External Mount End Block

Our largest external-mount end block, the SM can accommodate targets up to 4000 mm (supported) and has a power rating of up to 200 kW DC or 80 kHz MFAC.
It uses the same patented technology as our internal end blocks to deliver outstanding value, performance and reliability but has a wider substrate coverage and customizable drive shaft length.

Technical Data:

  • Power: max. 200 kW DC or MFAC
  • V/A: 1500 V/450 A
  • Target: max. 4000 mm
  • Average weight: 60 kg

Datasheet

B2B online


MM-SERIES External Mount End Block

MM-SERIES External Mount End Block

The MM is our mid-size external-mount end block.
It uses the same patented technology as our internal end blocks to deliver outstanding value, performance and reliability but has a wider substrate coverage and a customizable drive shaft length.

Technical Data:

  • Power: max. 100 kW DC or MFAC
  • V/A: 1500 V/225 A
  • Target: max. 2500 mm
  • Average weight: 30 kg

Datasheet

B2B online


CM-SERIES External Mount End Block

CM-SERIES External Mount End Block

For either 125 mm or 80 mm ID diameter targets, the CM is our most compact external-mount end block.
It uses the same patented technology as our internal end blocks to deliver outstanding value, performance and reliability but has a wider substrate coverage and a customizable drive shaft length.

Technical Data:

  • Power: max. 20 kW DC or MFAC
  • V/A: 1500 V/50 A
  • Target: max. 1000 mm
  • Average weight: 15 kg

Datasheet

B2B online

Swing Cathode™ SMS, MMS & CMS

Swing Cathode™ SMS, MMS & CMS

Swing Cathode™ SMS, MMS & CMS

With the Swing Cathode™ external-mount end block, the magnet pack swings in a programmable rotary axis that is independent of the rotating target tube, making it an ideal system for display or 3D part coating.
Other uses for Swing Cathodes™ are to pivot the magnet bar to a burn in location or to make magnet bar position adjustments via remote control.

Technical Data:

  • Power: max. 200 kW DC or MFAC
  • V/A: 1500 V/450 A
  • Target: max. 4000 mm
  • Average weight: 15 kg

Datasheet

B2B online


Swing-Duo™ Software

Swing-Duo™ Software

Swing-DUO™ (Dynamic Uniformity Optimization) software is designed to simulate the combined cathode array uniformity for individually optimized motion profiles used to control the motion of the SCI magnet bars when used with our exclusive Swing Cathode™.

Datasheet

B2B online

IM End Block

IM End Block™

IM End Block

While the typical end block rotates a target tube around a stationary magnet bar, the IM external-mount end block continuously rotates the magnet bar inside a stationary target tube.

  • For coating the insides of tubular-shaped objects
  • For decorative or tool coatings (where objects are placed around the cathode)

The IM can be configured for targets with inside diameters of either 80 mm or 125 mm.

Technical Data:

  • Power: max. 60 kW DC or MFAC
  • V/A: 1500 V/150 A
  • Target: max. 2000 mm
  • Maintenance: Do-it-yourself on your schedule and in your facility; Typical requirements: 1 hr./year to change seals

Datasheet

B2B online

Advanced Magnetics for 125 mm ID Targets

Advanced Magnetics

Advanced Magnetics

SCI Advanced Magnetics are available in three basic models: the three-row TRM-Bar™ and the four-row mQRM-Bar™ and QRM-Bar™, which have a patented turnaround to increase target utilization.

Datasheet

B2B online

Magnet Bars for 80 mm ID Targets

Magnet Bars for 80 mm ID Targets

Magnet Bars for 80 mm ID Targets

Available in two basic models, magnet bars for 80 mm inside diameter targets have the following advantages:

  • Designed using 3D finite element analysis software - for meeting your application requirements
  • Carefully matched, high-strength magnets that are factory calibrated using an automated magnet bar measurement tool - for uniform coatings
  • Fully encapsulated magnets and robust construction - for many years of trouble-free operation
  • Long-life, multi-roller system - for reliable sputter up, sputter down or off-angle sputtering
  • Magnetic positioning points that are easily set using simple tools - for easy uniformity adjustment
  • A simple installation procedure with solutions for vertical installation and connecting to end blocks from other manufacturers

Technical Data:

  • Target ID:
    TRM/SRM80-Bar™: 115 mm
  • Gauss (typical):
    TRM80-Bar™: To be determined
    SRM80-Bar™: 565
  • Sputter Angle:
    TRM80-Bar™: +/- 19°
    SRM80-Bar™: +/- 28°

Datasheet

B2B online

RAM-Bar™

RAM-Bar™

RAM-Bar™

With the Remotely Adjustable Magnet Bar, you can position and fine tune the distance between the magnetics and the target surface from outside the system and during operation to eliminate costly system shutdown.
Compatible with all SCI end blocks for 125 mm ID targets and available with any of the advanced magnetics, the RAM-Bar™ allows for up to 4 mm vertical difference between adjustment locations for very fine tuning. It can attain uniformity requirements of less than +/-1%.

Technical Data:

  • Target/Backing Tube Length: max. 550 - 4000 mm
  • Maximum Target Diameter: 180 mm
  • Adjuster Pitch: 305 mm (12 inches)
  • Maximum Film Uniformity: under +/-1%
  • Movement Precision: ± 250 µm of travel

Datasheet

B2B online

ARM-Bar™

ARM-Bar™

ARM-Bar™

We designed the Air Retractable Magnet Bar (ARM-Bar™) for sputtering ferromagnetic materials: alloys of iron, cobalt and a few “rare-earth" elements.
With the magnet bar raised and lowered using air bladders, the ARM-Bar™ provides the utilization and up-time benefits of a rotary cathode while allowing safe and easy insertion into the target, adjustment and removal.
In order to penetrate the magnetic material, the ARM-Bar™ has our strongest magnet bar, the QRM-Bar™.
Typical applications include EMI shielding, nickel sputtering as an adhesion layer for polyimide substrates, and magnetic storage.

Datasheet

B2B online

e-Cathode™

e-Cathode™

e-Cathode™

Sputtering Components e-Cathode™ process lids (compartments) and doors are a turnkey solution for new or existing coaters.

OEM lids for new coaters
Available in both digital and analog formats, vertical or horizontal orientation and customized to end user needs. OEM lids and doors can be purchased as a complete system or scaled-back according to your requirements.

Lid clones
For users needing to add cathodes to their existing coater, our process lid clones match all your current external mechanical and electrical interfaces but use SCI end blocks, magnet bars and control systems. We can also modify your existing lid designs to meet your changing needs.

Datasheet

B2B online

SCI | Rohrkathoden

ROHRKATHODEN

Sputtering Components, Inc. ist der weltweit führende Anbieter von zuverlässigen und preiswerten Endblöcken für Rohrkathoden, kompletten Kathodendeckeln und Magnetsystemen nach dem neuesten Stand der Technik. Alle SCI-Produkte ermöglichen dem Endbenutzer schnelle, kostengünstige, hausinterne Wartungsarbeiten. Dies ermöglicht die im Vergleich niedrigsten Gesamtinvestitionskosten.
robeko ist exklusiver Vertriebs- und Servicepartner von Sputtering Components für Mittel- und Osteuropa.

Internal-Mount End Blocks

SC-SERIES Internal Mount End Block

SC-SERIES Internal Mount End Block

The industry-standard size SC-Series, internal mount end block is the lowest cost, highest power, and most reliable end block available.

Technical Data:

  • Power: max. 200 kW DC or MFAC
  • V/A: 1500 V/450 A
  • Target: max. 4000 mm
  • Average weight: 40 kg

Datasheet

B2B online


MC-SERIES Internal Mount End Block

MC-SERIES Internal Mount End Block

With a more compact design than the SC and a lower power rating, the MC is designed for smaller systems.

Technical Data:

  • Power: max. 100 kW DC or MFAC
  • V/A: 1500 V/225 A
  • Target: max. 2500 mm
  • Thickness: 154 mm
  • Average weight: 20 kg

Datasheet

B2B online


cMC-SERIES Internal Mount End Block

cMC-SERIES Internal Mount End Block

The cMC is designed to directly replace compact end blocks from other manufacturers as well as to use in new systems.

Technical Data:

  • Power: max. 80 kW DC or MFAC
  • V/A: 1500 V/180 A
  • Target: max. 2000 mm
  • Thickness: 125 mm

Datasheet

B2B online


CC-SERIES Internal Mount End Block

CC-SERIES Internal Mount End Block

With its extremely compact package, the CC is designed for 80 mm ID targets, making it an excellent choice for small systems or R&D systems.

Technical Data:

  • Power: max. 20 kW DC or MFAC
  • V/A: 1500 V/50 A
  • Target: max. 1000 mm
  • Thickness: 122 mm

Datasheet

B2B online


TC-SERIES Internal Mount End Block

TC-SERIES Internal Mount End Block

Designed to replace planar cathodes where space on the end is limited, the TC-Series internal-mount end block will increase the output and quality of your existing coater.
A two-ended design, it has the most compact end block available for standard 125 mm ID industrial targets.

Technical Data:

  • Power: max. 40 kW DC or MFAC
  • V/A: 1500 V/100 A
  • Target: max. 1500 mm
  • Thickness: 58 mm on each side
  • Average weight: 10 kg

Datasheet

B2B online

External-Mount End Blocks

SM-SERIES External Mount End Block

SM-SERIES External Mount End Block

Our largest external-mount end block, the SM can accommodate targets up to 4000 mm (supported) and has a power rating of up to 200 kW DC or 80 kHz MFAC.
It uses the same patented technology as our internal end blocks to deliver outstanding value, performance and reliability but has a wider substrate coverage and customizable drive shaft length.

Technical Data:

  • Power: max. 200 kW DC or MFAC
  • V/A: 1500 V/450 A
  • Target: max. 4000 mm
  • Average weight: 60 kg

Datasheet

B2B online


MM-SERIES External Mount End Block

MM-SERIES External Mount End Block

The MM is our mid-size external-mount end block.
It uses the same patented technology as our internal end blocks to deliver outstanding value, performance and reliability but has a wider substrate coverage and a customizable drive shaft length.

Technical Data:

  • Power: max. 100 kW DC or MFAC
  • V/A: 1500 V/225 A
  • Target: max. 2500 mm
  • Average weight: 30 kg

Datasheet

B2B online


CM-SERIES External Mount End Block

CM-SERIES External Mount End Block

For either 125 mm or 80 mm ID diameter targets, the CM is our most compact external-mount end block.
It uses the same patented technology as our internal end blocks to deliver outstanding value, performance and reliability but has a wider substrate coverage and a customizable drive shaft length.

Technical Data:

  • Power: max. 20 kW DC or MFAC
  • V/A: 1500 V/50 A
  • Target: max. 1000 mm
  • Average weight: 15 kg

Datasheet

B2B online

Swing Cathode™ SMS, MMS & CMS

Swing Cathode™ SMS, MMS & CMS

Swing Cathode™ SMS, MMS & CMS

With the Swing Cathode™ external-mount end block, the magnet pack swings in a programmable rotary axis that is independent of the rotating target tube, making it an ideal system for display or 3D part coating.
Other uses for Swing Cathodes™ are to pivot the magnet bar to a burn in location or to make magnet bar position adjustments via remote control.

Technical Data:

  • Power: max. 200 kW DC or MFAC
  • V/A: 1500 V/450 A
  • Target: max. 4000 mm
  • Average weight: 15 kg

Datasheet

B2B online


Swing-Duo™ Software

Swing-Duo™ Software

Swing-DUO™ (Dynamic Uniformity Optimization) software is designed to simulate the combined cathode array uniformity for individually optimized motion profiles used to control the motion of the SCI magnet bars when used with our exclusive Swing Cathode™.

Datasheet

B2B online

IM End Block

IM End Block™

IM End Block

While the typical end block rotates a target tube around a stationary magnet bar, the IM external-mount end block continuously rotates the magnet bar inside a stationary target tube.

  • For coating the insides of tubular-shaped objects
  • For decorative or tool coatings (where objects are placed around the cathode)

The IM can be configured for targets with inside diameters of either 80 mm or 125 mm.

Technical Data:

  • Power: max. 60 kW DC or MFAC
  • V/A: 1500 V/150 A
  • Target: max. 2000 mm
  • Maintenance: Do-it-yourself on your schedule and in your facility; Typical requirements: 1 hr./year to change seals

Datasheet

B2B online

Advanced Magnetics for 125 mm ID Targets

Advanced Magnetics

Advanced Magnetics

SCI Advanced Magnetics are available in three basic models: the three-row TRM-Bar™ and the four-row mQRM-Bar™ and QRM-Bar™, which have a patented turnaround to increase target utilization.

Datasheet

B2B online

Magnet Bars for 80 mm ID Targets

Magnet Bars for 80 mm ID Targets

Magnet Bars for 80 mm ID Targets

Available in two basic models, magnet bars for 80 mm inside diameter targets have the following advantages:

  • Designed using 3D finite element analysis software - for meeting your application requirements
  • Carefully matched, high-strength magnets that are factory calibrated using an automated magnet bar measurement tool - for uniform coatings
  • Fully encapsulated magnets and robust construction - for many years of trouble-free operation
  • Long-life, multi-roller system - for reliable sputter up, sputter down or off-angle sputtering
  • Magnetic positioning points that are easily set using simple tools - for easy uniformity adjustment
  • A simple installation procedure with solutions for vertical installation and connecting to end blocks from other manufacturers

Technical Data:

  • Target ID:
    TRM/SRM80-Bar™: 115 mm
  • Gauss (typical):
    TRM80-Bar™: To be determined
    SRM80-Bar™: 565
  • Sputter Angle:
    TRM80-Bar™: +/- 19°
    SRM80-Bar™: +/- 28°

Datasheet

B2B online

RAM-Bar™

RAM-Bar™

RAM-Bar™

With the Remotely Adjustable Magnet Bar, you can position and fine tune the distance between the magnetics and the target surface from outside the system and during operation to eliminate costly system shutdown.
Compatible with all SCI end blocks for 125 mm ID targets and available with any of the advanced magnetics, the RAM-Bar™ allows for up to 4 mm vertical difference between adjustment locations for very fine tuning. It can attain uniformity requirements of less than +/-1%.

Technical Data:

  • Target/Backing Tube Length: max. 550 - 4000 mm
  • Maximum Target Diameter: 180 mm
  • Adjuster Pitch: 305 mm (12 inches)
  • Maximum Film Uniformity: under +/-1%
  • Movement Precision: ± 250 µm of travel

Datasheet

B2B online

ARM-Bar™

ARM-Bar™

ARM-Bar™

We designed the Air Retractable Magnet Bar (ARM-Bar™) for sputtering ferromagnetic materials: alloys of iron, cobalt and a few “rare-earth" elements.
With the magnet bar raised and lowered using air bladders, the ARM-Bar™ provides the utilization and up-time benefits of a rotary cathode while allowing safe and easy insertion into the target, adjustment and removal.
In order to penetrate the magnetic material, the ARM-Bar™ has our strongest magnet bar, the QRM-Bar™.
Typical applications include EMI shielding, nickel sputtering as an adhesion layer for polyimide substrates, and magnetic storage.

Datasheet

B2B online

e-Cathode™

e-Cathode™

e-Cathode™

Sputtering Components e-Cathode™ process lids (compartments) and doors are a turnkey solution for new or existing coaters.

OEM lids for new coaters
Available in both digital and analog formats, vertical or horizontal orientation and customized to end user needs. OEM lids and doors can be purchased as a complete system or scaled-back according to your requirements.

Lid clones
For users needing to add cathodes to their existing coater, our process lid clones match all your current external mechanical and electrical interfaces but use SCI end blocks, magnet bars and control systems. We can also modify your existing lid designs to meet your changing needs.

Datasheet

B2B online

SCI | Rohrkathoden

PLANARKATHODEN

Die einzigartigen IONIX Magnetron-Sputterquellen verfügen über eine flexible Architektur, um den teilweise widersprüchlichen Leistungsanforderungen der modernen Vakuumbeschichtungstechnologie gerecht zu werden. Das IONIX-Konzept basiert auf maximaler Zuverlässigkeit, anpassungsfähigem Magnetarray-Layout und vielseitigem Design, um sich an die spezifischen Anwendungen des Kunden anzupassen.
robeko ist seit 2017 Vertriebspartner für Thin Film Consulting.

THFC | Planarkathoden
Round Planar Magnetron

Round Planar Magnetrons

Round Planar Magnetrons

IONIX® round magnetrons are available in target diameters of 1.25” to 10” and include standard KF/ISO interfaces for use with virtually any type of vacuum chamber installation.

Datasheet

BUY online

Rectangular Magnetrons

Rectangular Magnetrons

Rectangular Magnetrons

IONIX® rectangular magnetron sputtering sources with advanced water cooling circuits are designed for industrial production purposes, offering:
• High-reate metallic sputtering
• RF sputtering of dielectric targets
• Pulsed reactive mode sputtering for high rate
• Deposition of dielectric thin films

Datasheet

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PLANARKATHODEN

Die einzigartigen IONIX Magnetron-Sputterquellen verfügen über eine flexible Architektur, um den teilweise widersprüchlichen Leistungsanforderungen der modernen Vakuumbeschichtungstechnologie gerecht zu werden. Das IONIX-Konzept basiert auf maximaler Zuverlässigkeit, anpassungsfähigem Magnetarray-Layout und vielseitigem Design, um sich an die spezifischen Anwendungen des Kunden anzupassen.
robeko ist seit 2017 Vertriebspartner für Thin Film Consulting.

Round Planar Magnetron

Round Planar Magnetrons

Round Planar Magnetrons

IONIX® round magnetrons are available in target diameters of 1.25” to 10” and include standard KF/ISO interfaces for use with virtually any type of vacuum chamber installation.

Datasheet

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Rectangular Magnetrons

Rectangular Magnetrons

Rectangular Magnetrons

IONIX® rectangular magnetron sputtering sources with advanced water cooling circuits are designed for industrial production purposes, offering:
• High-reate metallic sputtering
• RF sputtering of dielectric targets
• Pulsed reactive mode sputtering for high rate
• Deposition of dielectric thin films

Datasheet

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THFC | Planarkathoden

PLANARKATHODEN

Die einzigartigen IONIX Magnetron-Sputterquellen verfügen über eine flexible Architektur, um den teilweise widersprüchlichen Leistungsanforderungen der modernen Vakuumbeschichtungstechnologie gerecht zu werden. Das IONIX-Konzept basiert auf maximaler Zuverlässigkeit, anpassungsfähigem Magnetarray-Layout und vielseitigem Design, um sich an die spezifischen Anwendungen des Kunden anzupassen.
robeko ist seit 2017 Vertriebspartner für Thin Film Consulting.

Round Planar Magnetron

Round Planar Magnetrons

Round Planar Magnetrons

IONIX® round magnetrons are available in target diameters of 1.25” to 10” and include standard KF/ISO interfaces for use with virtually any type of vacuum chamber installation.

Datasheet

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Rectangular Magnetrons

Rectangular Magnetrons

Rectangular Magnetrons

IONIX® rectangular magnetron sputtering sources with advanced water cooling circuits are designed for industrial production purposes, offering:
• High-reate metallic sputtering
• RF sputtering of dielectric targets
• Pulsed reactive mode sputtering for high rate
• Deposition of dielectric thin films

Datasheet

BUY online

THFC | Planarkathoden

HF-GENERATOREN

robeko bietet Produkte der Seren IPS Inc. an, einem führenden Hersteller von elektrischen Generatoren und Zubehör für die Erzeugung und Einspeisung von HF Leistung für Plasma- und andere Anwendungen.
Seren IPS. Inc. sichert durch kontinuierliche Produktentwicklung in Verbindung mit erstklassigem Applications Engineering den Erfolg unserer Kunden.
Der Vertrieb für Seren IPS Inc. in Europa wird gemeinsam mit der RF-Industrie in Großbritannien durchgeführt.

SEREN | HF-Generatoren
SEREN Power Supplies

SEREN Power Supplies

SEREN Power Supplies

robeko provides products of Seren IPS Inc., a leading manufacturer of RF power delivery components.
At Seren IPS. Inc., innovative technology, applications and design expertise are combined with world class support to deliver critical RF power solutions including RF Generators, Matching Networks and accessories. Continuous product development and dedicated Application/Design Engineering services ensure success for our customers.

Datasheet

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SEREN RF-Generators, R & HR-Series

SEREN RF-Generators, R & HR-Series

SEREN RF-Generators, R & HR-Series

Seren “HR Series” products incorporate a separate surface mount technology printed circuit board for controls and RF amplifier. The RF amplifier is powered by a switch-mode power supply.
Seren “HR Series” products utilize LDMOS Field-Effect Transistors in the power amplifier stages. The unit operates in a class AB mode providing power accuracy and stability across the entire power range.

Datasheet

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SEREN Automatic Matching Networks, AT & ATS-Series

SEREN Automatic Matching Networks, AT & ATS-Series

SEREN Automatic Matching Networks, AT & ATS-Series

• AT Series (Industrial Applications/Sputter/Etch/Deposition)
• ATS Series (Semiconductor/Sputter/Etch/Deposition/ALD)

Datasheet

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HF-GENERATOREN

robeko bietet Produkte der Seren IPS Inc. an, einem führenden Hersteller von elektrischen Generatoren und Zubehör für die Erzeugung und Einspeisung von HF Leistung für Plasma- und andere Anwendungen.
Seren IPS. Inc. sichert durch kontinuierliche Produktentwicklung in Verbindung mit erstklassigem Applications Engineering den Erfolg unserer Kunden.
Der Vertrieb für Seren IPS Inc. in Europa wird gemeinsam mit der RF-Industrie in Großbritannien durchgeführt.

SEREN Power Supplies

SEREN Power Supplies

SEREN Power Supplies

robeko provides products of Seren IPS Inc., a leading manufacturer of RF power delivery components.
At Seren IPS. Inc., innovative technology, applications and design expertise are combined with world class support to deliver critical RF power solutions including RF Generators, Matching Networks and accessories. Continuous product development and dedicated Application/Design Engineering services ensure success for our customers.

Datasheet

BUY online

SEREN RF-Generators, R & HR-Series

SEREN RF-Generators, R & HR-Series

SEREN RF-Generators, R & HR-Series

Seren “HR Series” products incorporate a separate surface mount technology printed circuit board for controls and RF amplifier. The RF amplifier is powered by a switch-mode power supply.
Seren “HR Series” products utilize LDMOS Field-Effect Transistors in the power amplifier stages. The unit operates in a class AB mode providing power accuracy and stability across the entire power range.

Datasheet

BUY online

SEREN Automatic Matching Networks, AT & ATS-Series

SEREN Automatic Matching Networks, AT & ATS-Series

SEREN Automatic Matching Networks, AT & ATS-Series

• AT Series (Industrial Applications/Sputter/Etch/Deposition)
• ATS Series (Semiconductor/Sputter/Etch/Deposition/ALD)

Datasheet

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SEREN | HF-Generatoren

HF-GENERATOREN

robeko bietet Produkte der Seren IPS Inc. an, einem führenden Hersteller von elektrischen Generatoren und Zubehör für die Erzeugung und Einspeisung von HF Leistung für Plasma- und andere Anwendungen.
Seren IPS. Inc. sichert durch kontinuierliche Produktentwicklung in Verbindung mit erstklassigem Applications Engineering den Erfolg unserer Kunden.
Der Vertrieb für Seren IPS Inc. in Europa wird gemeinsam mit der RF-Industrie in Großbritannien durchgeführt.

SEREN Power Supplies

SEREN Power Supplies

SEREN Power Supplies

robeko provides products of Seren IPS Inc., a leading manufacturer of RF power delivery components.
At Seren IPS. Inc., innovative technology, applications and design expertise are combined with world class support to deliver critical RF power solutions including RF Generators, Matching Networks and accessories. Continuous product development and dedicated Application/Design Engineering services ensure success for our customers.

Datasheet

BUY online

SEREN RF-Generators, R & HR-Series

SEREN RF-Generators, R & HR-Series

SEREN RF-Generators, R & HR-Series

Seren “HR Series” products incorporate a separate surface mount technology printed circuit board for controls and RF amplifier. The RF amplifier is powered by a switch-mode power supply.
Seren “HR Series” products utilize LDMOS Field-Effect Transistors in the power amplifier stages. The unit operates in a class AB mode providing power accuracy and stability across the entire power range.

Datasheet

BUY online

SEREN Automatic Matching Networks, AT & ATS-Series

SEREN Automatic Matching Networks, AT & ATS-Series

SEREN Automatic Matching Networks, AT & ATS-Series

• AT Series (Industrial Applications/Sputter/Etch/Deposition)
• ATS Series (Semiconductor/Sputter/Etch/Deposition/ALD)

Datasheet

BUY online

SEREN | HF-Generatoren

PULS GENERATOREN

Die MAGPULS – Puls Generatoren bieten höchste Flexibilität und höchste Leistung für Plasmanitrierungsprozesse, Vorspannungsanwendungen und Magnetron-Sputtern, einschließlich ambitionierter reaktiver und HIPIMS-Prozesse.

MAGPULS | Puls Generatoren
MAGPULS Pulse Units

MAGPULS Pulse Units

MAGPULS Pulse Units

Magpuls Pulse Power supplies provide highest flexibility and supreme performance for plasma nitriting processes, bias applications and magnetron sputtering including ambitious reactive and HIPIMS processes.
The MAGPULS Unipolar and Bipolar Pulse Power Supply series MP 1, MP 2 and MP 2 – HC are constructed in two separate units. One unit is the DC power supply which provides the DC power into the big capacitor bank of the pulse unit and the pulse unit with the integrated sophisticated ARC Management.

Datasheet

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MP 1 - Unipolar Pulse Unit

MP 1 - Unipolar Pulse Unit

MP 1 - Unipolar Pulse Unit

The unipolar pulsed Power Supplies are designed in modular technology. The main components of these power supplies are the DC-Power supply and the pulsing unit which generate the pulsed output voltage with adjustable pulse frequency in the range from DC up to 100kHz. The Arc-management with highest efficiency is adjustable for all different Plasma treatment processes and grants a proper layer quality without any layer damages on the surface.

Datasheet

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MP 2 - Bipolar Pulse Unit

MP 2 - Bipolar Pulse Unit

MP 2 - Bipolar Pulse Unit

The bipolar pulsed power supplies model MAGPULS BP are constructed for plasma excitation with highest performance. The bipolar pulsed power supply is a modular designed system consisting of the DC power unit and the bipolar pulse unit, which switches the voltage with a freely adjustable pulse of alternating polarity into the plasma system.

Datasheet

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MP 2 - AS Asymmetric Bipolar Pulse Unit

MP 2 - AS Asymmetric Bipolar Pulse Unit

MP 2 - AS Asymmetric Bipolar Pulse Unit

The MAGPULS Bipolar Pulse Power supplies series MP 2 -AS are designed for operating with dual magnetrons for reactive sputtering on substrates as for glass, plastics and metal. The individual operating modes and the enhanced ARC-management allows the bipolar pulse power supplies operation in high quality processes. Typical applications are production of flat panel displays, solar cells, decorative and hard coatings.

Datasheet

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MP 2 - HC Bipolar HIPIMS Pulse Unit

MP 2 - HC Bipolar HIPIMS Pulse Unit

MP 2 - HC Bipolar HIPIMS Pulse Unit

Thanks to the short extremely high peak current pulses the pulse power supplies model MAGPULS HPP generate plasma intensity with highest density which leads to an excellent coating quality in high-pulse sputtering (HIPIMS).
Excellent film properties in terms of wear resistance, adhesive strength, hardness and homogeneity.
Easy integration in existing magnetron sputter systems.

Datasheet

BUY online

PULS GENERATOREN

Die MAGPULS – Puls Generatoren bieten höchste Flexibilität und höchste Leistung für Plasmanitrierungsprozesse, Vorspannungsanwendungen und Magnetron-Sputtern, einschließlich ambitionierter reaktiver und HIPIMS-Prozesse.

MAGPULS Pulse Units

MAGPULS Pulse Units

MAGPULS Pulse Units

Magpuls Pulse Power supplies provide highest flexibility and supreme performance for plasma nitriting processes, bias applications and magnetron sputtering including ambitious reactive and HIPIMS processes.
The MAGPULS Unipolar and Bipolar Pulse Power Supply series MP 1, MP 2 and MP 2 – HC are constructed in two separate units. One unit is the DC power supply which provides the DC power into the big capacitor bank of the pulse unit and the pulse unit with the integrated sophisticated ARC Management.

Datasheet

BUY online

MP 1 - Unipolar Pulse Unit

MP 1 - Unipolar Pulse Unit

MP 1 - Unipolar Pulse Unit

The unipolar pulsed Power Supplies are designed in modular technology. The main components of these power supplies are the DC-Power supply and the pulsing unit which generate the pulsed output voltage with adjustable pulse frequency in the range from DC up to 100kHz. The Arc-management with highest efficiency is adjustable for all different Plasma treatment processes and grants a proper layer quality without any layer damages on the surface.

Datasheet

BUY online

MP 2 - Bipolar Pulse Unit

MP 2 - Bipolar Pulse Unit

MP 2 - Bipolar Pulse Unit

The bipolar pulsed power supplies model MAGPULS BP are constructed for plasma excitation with highest performance. The bipolar pulsed power supply is a modular designed system consisting of the DC power unit and the bipolar pulse unit, which switches the voltage with a freely adjustable pulse of alternating polarity into the plasma system.

Datasheet

BUY online

MP 2 - AS Asymmetric Bipolar Pulse Unit

MP 2 - AS Asymmetric Bipolar Pulse Unit

MP 2 - AS Asymmetric Bipolar Pulse Unit

The MAGPULS Bipolar Pulse Power supplies series MP 2 -AS are designed for operating with dual magnetrons for reactive sputtering on substrates as for glass, plastics and metal. The individual operating modes and the enhanced ARC-management allows the bipolar pulse power supplies operation in high quality processes. Typical applications are production of flat panel displays, solar cells, decorative and hard coatings.

Datasheet

BUY online

MP 2 - HC Bipolar HIPIMS Pulse Unit

MP 2 - HC Bipolar HIPIMS Pulse Unit

MP 2 - HC Bipolar HIPIMS Pulse Unit

Thanks to the short extremely high peak current pulses the pulse power supplies model MAGPULS HPP generate plasma intensity with highest density which leads to an excellent coating quality in high-pulse sputtering (HIPIMS).
Excellent film properties in terms of wear resistance, adhesive strength, hardness and homogeneity.
Easy integration in existing magnetron sputter systems.

Datasheet

BUY online

MAGPULS | Puls Generatoren

PULS
GENERATOREN

Die MAGPULS – Puls Generatoren bieten höchste Flexibilität und höchste Leistung für Plasmanitrierungsprozesse, Vorspannungsanwendungen und Magnetron-Sputtern, einschließlich ambitionierter reaktiver und HIPIMS-Prozesse.

MAGPULS Pulse Units

MAGPULS Pulse Units

MAGPULS Pulse Units

Magpuls Pulse Power supplies provide highest flexibility and supreme performance for plasma nitriting processes, bias applications and magnetron sputtering including ambitious reactive and HIPIMS processes.
The MAGPULS Unipolar and Bipolar Pulse Power Supply series MP 1, MP 2 and MP 2 – HC are constructed in two separate units. One unit is the DC power supply which provides the DC power into the big capacitor bank of the pulse unit and the pulse unit with the integrated sophisticated ARC Management.

Datasheet

BUY online

MP 1 - Unipolar Pulse Unit

MP 1 - Unipolar Pulse Unit

MP 1 - Unipolar Pulse Unit

The unipolar pulsed Power Supplies are designed in modular technology. The main components of these power supplies are the DC-Power supply and the pulsing unit which generate the pulsed output voltage with adjustable pulse frequency in the range from DC up to 100kHz. The Arc-management with highest efficiency is adjustable for all different Plasma treatment processes and grants a proper layer quality without any layer damages on the surface.

Datasheet

BUY online

MP 2 - Bipolar Pulse Unit

MP 2 - Bipolar Pulse Unit

MP 2 - Bipolar Pulse Unit

The bipolar pulsed power supplies model MAGPULS BP are constructed for plasma excitation with highest performance. The bipolar pulsed power supply is a modular designed system consisting of the DC power unit and the bipolar pulse unit, which switches the voltage with a freely adjustable pulse of alternating polarity into the plasma system.

Datasheet

BUY online

MP 2 - AS Asymmetric Bipolar Pulse Unit

MP 2 - AS Asymmetric Bipolar Pulse Unit

MP 2 - AS Asymmetric Bipolar Pulse Unit

The MAGPULS Bipolar Pulse Power supplies series MP 2 -AS are designed for operating with dual magnetrons for reactive sputtering on substrates as for glass, plastics and metal. The individual operating modes and the enhanced ARC-management allows the bipolar pulse power supplies operation in high quality processes. Typical applications are production of flat panel displays, solar cells, decorative and hard coatings.

Datasheet

BUY online

MP 2 - HC Bipolar HIPIMS Pulse Unit

MP 2 - HC Bipolar HIPIMS Pulse Unit

MP 2 - HC Bipolar HIPIMS Pulse Unit

Thanks to the short extremely high peak current pulses the pulse power supplies model MAGPULS HPP generate plasma intensity with highest density which leads to an excellent coating quality in high-pulse sputtering (HIPIMS).
Excellent film properties in terms of wear resistance, adhesive strength, hardness and homogeneity.
Easy integration in existing magnetron sputter systems.

Datasheet

BUY online