PLASMA TREATMENT Komponenten für PVD & PECVD Prozesse

PLASMA & IONEN-STRAHLQUELLEN

Die für die Behandlung und Modifikation von Oberflächen benötigten Plasmen unterscheiden sich teilweise in Ihren Eigenschaften von den bei der PECVD verwendeten. Der Erzeugung dienen meist die gleichen Prinzipien wie HF- oder Mikrowellen ECR. Um den genauen Effekt auf die Oberfläche einstellen zu können, werden die im Plasma befindlichen Ionen oft nachbeschleunigt um höhere Energien in die Oberflächen einzubringen…

PLASMA TREATMENT KOMPONENTEN | Plasma & Ion Beam Sources
robeko MIRO 200 CI | Microwave Plasma Source

MIRO 200 CI | Microwave Plasma Source

MIRO 200 CI | Microwave Plasma Source

The MIRO 200 CI.

Datasheet

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sairem AuraWave | ECR Coaxial Plasma Source

sairem AuraWave | ECR Coaxial Plasma Source

sairem AuraWave | ECR Coaxial Plasma Source

Aura-Wave has been designed to be self-adapted once the plasma ignited. A magnetic field combined to the electromagnetic wave allows the creation of plasma at low pressure – range of 10-3 mbar.

Datasheet

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SCI envis-Ion™ DMPTS | Dual Magnetron Pretreatment Source

envis-Ion™ DMPTS | Dual Magnetron Pretreatment Source

envis-Ion™ DMPTS | Dual Magnetron Pretreatment Source

Our largest external-mount end block, the SM can accommodate targets up to 4000 mm (supported) and has a power rating of up to 200 kW DC or 80 kHz MFAC.
The envis-ION™ Dual Magnetron Pretreatment Source has a wide range of operation for improved adhesion and durability.

Technical Data:

• Max Power: 5 KW/m
• Typical Power: 2-4 KW/m
• Operating Pressure: 1-40 m Torr
• Pet Surface Energy at 6.7 m/min: > 65 Dynes

Datasheet

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IONICS | IonLAB

IONICS | IonLAB

IONICS | IonLAB

IONICS has developed the HARDION industrial ion gun solution solving different technical and economic issues generally associated to the process. Enhance the surface properties of your material without any coatings and using an environmentally friendly technology. The innovation is supported by a Walloon initiative called WALIBEAM and several industrial majors in the fields of surface treatment of glass, metal and polymer are involved.

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IONICS | IonPRo

IONICS | IonPRo

IONICS | IonPRo

Surface modifications, to improve a specific function of an object, have limited robustness. Our Ion implantation technologies (based on Quertech-Ionics ECR sources) open the way to innovative and lasting surface functional products.

Datasheet

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PLASMA & IONEN-STRAHLQUELLEN

Die für die Behandlung und Modifikation von Oberflächen benötigten Plasmen unterscheiden sich teilweise in Ihren Eigenschaften von den bei der PECVD verwendeten. Der Erzeugung dienen meist die gleichen Prinzipien wie HF- oder Mikrowellen ECR. Um den genauen Effekt auf die Oberfläche einstellen zu können, werden die im Plasma befindlichen Ionen oft nachbeschleunigt um höhere Energien in die Oberflächen einzubringen, oder aber im Gegenteil dazu sogar vom Substrat ferngehalten um dort möglichst keine Schäden anzurichten.

robeko MIRO 200 CI | Microwave Plasma Source

MIRO 200 CI | Microwave Plasma Source

MIRO 200 CI | Microwave Plasma Source

The MIRO 200 CI.

Datasheet

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sairem AuraWave | ECR Coaxial Plasma Source

sairem AuraWave | ECR Coaxial Plasma Source

sairem AuraWave | ECR Coaxial Plasma Source

Aura-Wave has been designed to be self-adapted once the plasma ignited. A magnetic field combined to the electromagnetic wave allows the creation of plasma at low pressure – range of 10-3 mbar.

Datasheet

BUY online

SCI envis-Ion™ DMPTS | Dual Magnetron Pretreatment Source

envis-Ion™ DMPTS | Dual Magnetron Pretreatment Source

envis-Ion™ DMPTS | Dual Magnetron Pretreatment Source

Our largest external-mount end block, the SM can accommodate targets up to 4000 mm (supported) and has a power rating of up to 200 kW DC or 80 kHz MFAC.
The envis-ION™ Dual Magnetron Pretreatment Source has a wide range of operation for improved adhesion and durability.

Technical Data:

• Max Power: 5 KW/m
• Typical Power: 2-4 KW/m
• Operating Pressure: 1-40 m Torr
• Pet Surface Energy at 6.7 m/min: > 65 Dynes

Datasheet

BUY online

IONICS | IonLAB

IONICS | IonLAB

IONICS | IonLAB

IONICS has developed the HARDION industrial ion gun solution solving different technical and economic issues generally associated to the process. Enhance the surface properties of your material without any coatings and using an environmentally friendly technology. The innovation is supported by a Walloon initiative called WALIBEAM and several industrial majors in the fields of surface treatment of glass, metal and polymer are involved.

Datasheet

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IONICS | IonPRo

IONICS | IonPRo

IONICS | IonPRo

Surface modifications, to improve a specific function of an object, have limited robustness. Our Ion implantation technologies (based on Quertech-Ionics ECR sources) open the way to innovative and lasting surface functional products.

Datasheet

BUY online

PLASMA TREATMENT KOMPONENTEN | Plasma & Ion Beam Sources

PLASMA &
IONEN-
STRAHLQUELLEN

Die für die Behandlung und Modifikation von Oberflächen benötigten Plasmen unterscheiden sich teilweise in Ihren Eigenschaften von den bei der PECVD verwendeten. Der Erzeugung dienen meist die gleichen Prinzipien wie HF- oder Mikrowellen ECR. Um den genauen Effekt auf die Oberfläche einstellen zu können, werden die im Plasma befindlichen Ionen oft nachbeschleunigt um höhere Energien in die Oberflächen einzubringen, oder aber im Gegenteil dazu sogar vom Substrat ferngehalten um dort möglichst keine Schäden anzurichten.

robeko MIRO 200 CI | Microwave Plasma Source

MIRO 200 CI | Microwave Plasma Source

MIRO 200 CI | Microwave Plasma Source

The MIRO 200 CI.

Datasheet

BUY online

sairem AuraWave | ECR Coaxial Plasma Source

sairem AuraWave | ECR Coaxial Plasma Source

sairem AuraWave | ECR Coaxial Plasma Source

Aura-Wave has been designed to be self-adapted once the plasma ignited. A magnetic field combined to the electromagnetic wave allows the creation of plasma at low pressure – range of 10-3 mbar.

Datasheet

BUY online

SCI envis-Ion™ DMPTS | Dual Magnetron Pretreatment Source

envis-Ion™ DMPTS | Dual Magnetron Pretreatment Source

envis-Ion™ DMPTS | Dual Magnetron Pretreatment Source

Our largest external-mount end block, the SM can accommodate targets up to 4000 mm (supported) and has a power rating of up to 200 kW DC or 80 kHz MFAC.
The envis-ION™ Dual Magnetron Pretreatment Source has a wide range of operation for improved adhesion and durability.

Technical Data:

• Max Power: 5 KW/m
• Typical Power: 2-4 KW/m
• Operating Pressure: 1-40 m Torr
• Pet Surface Energy at 6.7 m/min: > 65 Dynes

Datasheet

BUY online

IONICS | IonLAB

IONICS | IonLAB

IONICS | IonLAB

IONICS has developed the HARDION industrial ion gun solution solving different technical and economic issues generally associated to the process. Enhance the surface properties of your material without any coatings and using an environmentally friendly technology. The innovation is supported by a Walloon initiative called WALIBEAM and several industrial majors in the fields of surface treatment of glass, metal and polymer are involved.

Datasheet

BUY online

IONICS | IonPRo

IONICS | IonPRo

IONICS | IonPRo

Surface modifications, to improve a specific function of an object, have limited robustness. Our Ion implantation technologies (based on Quertech-Ionics ECR sources) open the way to innovative and lasting surface functional products.

Datasheet

BUY online

PLASMA TREATMENT KOMPONENTEN | Plasma & Ion Beam Sources

PLASMA MONITORING &
PROCESS CONTROL

Die Prozesssteuerung ist bei industriellen Plasmaanwendungen unerlässlich, um Zuverlässigkeit und hohe Qualität zu gewährleisten. Das EMICON-System ist ein Plasmamonitorsystem, das auf der optischen Emissionsspektroskopie basiert und in Echtzeit gestattet, die Prozesse in Ihrer Plasmaanwendung zu analysieren, zu optimieren und zu steuern.

PLASUS | Plasma Monitoring & Process Control
PLASUS | EMICON MC

EMICON MC | Plasma Monitor and Process Control System

EMICON MC | Plasma Monitor and Process Control System

The EMICON MC systems are qualified for most applications in plasma technology for analyzing the plasma, for optimizing the process, for plasma monitoring, for quality control and for process controlling. The turn-key EMICON MC systems come with all features necessary for monitoring common plasma processes and for communicating via analog and digital outputs with the application control.

Datasheet

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PLASUS | EMICON SA

EMICON SA | Plasma Monitor and Process Control System

EMICON SA | Plasma Monitor and Process Control System

The EMICON SA systems are especially designed for process control and quality assurance in industrial plants and production lines. The integrated processor unit ensures stand-alone operation in 24/7 mode and easy integration of the EMICON SA system into the system conrol by e.g. LAN or Profibus.

Datasheet

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PLASUS | EMICON HR

EMICON HR | Plasma Monitor and Process Control System

EMICON HR | Plasma Monitor and Process Control System

The EMICON HR system is a high-resolution spectrometer system and it is especially qualified for detailed spectral plasma analysis and plasma monitoring but also for quality control and process controlling. The single channel EMICON HR system comes with all features necessary for monitoring and anaylzing process plasmas in detail.

Datasheet

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PLASUS | VACUUMOPTICS

VACUUMOPTICS | Optical Components

VACUUMOPTICS | Optical Components

Optical components are the interface between the application process and the detection system: The optics should transfer as much light intensity as possible and it should be flexible and resistant to industrial environments.

Datasheet

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PLASUS | SPECLINE

SPECLINE | Spectral Line Identification

SPECLINE | Spectral Line Identification

PLASUS SpecLine is the most powerful software tool for evaluating your spectral data. The worldwide unique database for atoms and molecules makes line identification fast and easy.

Datasheet

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PLASMA MONITORING &
PROCESS CONTROL

Die Prozesssteuerung ist bei industriellen Plasmaanwendungen unerlässlich, um Zuverlässigkeit und hohe Qualität zu gewährleisten. Das EMICON-System ist ein Plasmamonitorsystem, das auf der optischen Emissionsspektroskopie basiert und in Echtzeit gestattet, die Prozesse in Ihrer Plasmaanwendung zu analysieren, zu optimieren und zu steuern.

PLASUS | EMICON MC

EMICON MC | Plasma Monitor and Process Control System

EMICON MC | Plasma Monitor and Process Control System

The EMICON MC systems are qualified for most applications in plasma technology for analyzing the plasma, for optimizing the process, for plasma monitoring, for quality control and for process controlling. The turn-key EMICON MC systems come with all features necessary for monitoring common plasma processes and for communicating via analog and digital outputs with the application control.

Datasheet

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PLASUS | EMICON SA

EMICON SA | Plasma Monitor and Process Control System

EMICON SA | Plasma Monitor and Process Control System

The EMICON SA systems are especially designed for process control and quality assurance in industrial plants and production lines. The integrated processor unit ensures stand-alone operation in 24/7 mode and easy integration of the EMICON SA system into the system conrol by e.g. LAN or Profibus.

Datasheet

BUY online

PLASUS | EMICON HR

EMICON HR | Plasma Monitor and Process Control System

EMICON HR | Plasma Monitor and Process Control System

The EMICON HR system is a high-resolution spectrometer system and it is especially qualified for detailed spectral plasma analysis and plasma monitoring but also for quality control and process controlling. The single channel EMICON HR system comes with all features necessary for monitoring and anaylzing process plasmas in detail.

Datasheet

BUY online

PLASUS | VACUUMOPTICS

VACUUMOPTICS | Optical Components

VACUUMOPTICS | Optical Components

Optical components are the interface between the application process and the detection system: The optics should transfer as much light intensity as possible and it should be flexible and resistant to industrial environments.

Datasheet

BUY online

PLASUS | SPECLINE

SPECLINE | Spectral Line Identification

SPECLINE | Spectral Line Identification

PLASUS SpecLine is the most powerful software tool for evaluating your spectral data. The worldwide unique database for atoms and molecules makes line identification fast and easy.

Datasheet

BUY online

PLASUS | Plasma Monitoring & Process Control

PLASMA MONITORING &
PROCESS CONTROL

Die Prozesssteuerung ist bei industriellen Plasmaanwendungen unerlässlich, um Zuverlässigkeit und hohe Qualität zu gewährleisten. Das EMICON-System ist ein Plasmamonitorsystem, das auf der optischen Emissionsspektroskopie basiert und in Echtzeit gestattet, die Prozesse in Ihrer Plasmaanwendung zu analysieren, zu optimieren und zu steuern.

PLASUS | EMICON MC

EMICON MC | Plasma Monitor and Process Control System

EMICON MC | Plasma Monitor and Process Control System

The EMICON MC systems are qualified for most applications in plasma technology for analyzing the plasma, for optimizing the process, for plasma monitoring, for quality control and for process controlling. The turn-key EMICON MC systems come with all features necessary for monitoring common plasma processes and for communicating via analog and digital outputs with the application control.

Datasheet

BUY online

PLASUS | EMICON SA

EMICON SA | Plasma Monitor and Process Control System

EMICON SA | Plasma Monitor and Process Control System

The EMICON SA systems are especially designed for process control and quality assurance in industrial plants and production lines. The integrated processor unit ensures stand-alone operation in 24/7 mode and easy integration of the EMICON SA system into the system conrol by e.g. LAN or Profibus.

Datasheet

BUY online

PLASUS | EMICON HR

EMICON HR | Plasma Monitor and Process Control System

EMICON HR | Plasma Monitor and Process Control System

The EMICON HR system is a high-resolution spectrometer system and it is especially qualified for detailed spectral plasma analysis and plasma monitoring but also for quality control and process controlling. The single channel EMICON HR system comes with all features necessary for monitoring and anaylzing process plasmas in detail.

Datasheet

BUY online

PLASUS | VACUUMOPTICS

VACUUMOPTICS | Optical Components

VACUUMOPTICS | Optical Components

Optical components are the interface between the application process and the detection system: The optics should transfer as much light intensity as possible and it should be flexible and resistant to industrial environments.

Datasheet

BUY online

PLASUS | SPECLINE

SPECLINE | Spectral Line Identification

SPECLINE | Spectral Line Identification

PLASUS SpecLine is the most powerful software tool for evaluating your spectral data. The worldwide unique database for atoms and molecules makes line identification fast and easy.

Datasheet

BUY online

PLASUS | Plasma Monitoring & Process Control

PLASMA TREATMENT Komponenten